| 摘要 |
Provided is a polishing pad capable, when polishing an object to be polished that has a protrusion and/or recess on the surface, of adequately polishing the parts near the protrusion or the inner surface of the recess on the surface of the object being polished. The polishing pad has a raised nap section (1) in which multiple fibers (12) of at least 2 mm length are raised on the surface of a base (11), and the mass of the fibers (12) is at least 250 g/m2. Said polishing pad is used for polishing an object (2) to be polished that contains metal, alloy or metal oxide material and has a protrusion (21) and/or a recess (22) on the surface. |
