IMPROVED SPUTTERING COIL PRODUCT AND METHOD OF MAKING
摘要
A high surface area coil for use with a physical vapor deposition apparatus comprising a first surface. At least a portion of the first surface has a macrotexture with a surface roughness between about 15 µm and about 150 µm. At least a portion of the first surface has a microtexture with a surface roughness between about 2 µm and 15 µm.
申请公布号
WO2017015191(A1)
申请公布日期
2017.01.26
申请号
WO2016US42740
申请日期
2016.07.18
申请人
HONEYWELL INTERNATIONAL INC.
发明人
DUNLOP, John A.;HUBERT, Kevin T.;RUZICKA, Jacob C.;WRAGG, Andrew N.A.;BLONDELL, Michael D.;JARDEE, William P.;JOHN, Phillip F.;LARA, Edward P.;MEYER, Wayne D.;DAUB, Adam P.;BUCKHART, Scott A.;JUNTTILA, Travis C.
