| 发明名称 |
CHARGED PARTICLE BEAM APPARATUS |
| 摘要 |
A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile. |
| 申请公布号 |
US2017025251(A1) |
申请公布日期 |
2017.01.26 |
| 申请号 |
US201615217460 |
申请日期 |
2016.07.22 |
| 申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
ENYAMA Momoyo;FUKUDA Muneyuki;KAZUMI Hideyuki;HAMADA Koichi;TANIMOTO Sayaka |
| 分类号 |
H01J37/26;H01J37/22 |
主分类号 |
H01J37/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A charged particle beam apparatus comprising:
a charged particle source; an off-axis illumination aperture; a lens; a computer; and a memory unit, wherein a signal, generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture and the lens, is detected, so as to acquire an image, and wherein the computer has: a beam-computing-process unit that performs a beam computation process to estimate a beam profile of the charged particle beam; and a sharpening process unit that performs a sharpening process to sharpen the image using the estimated beam profile. |
| 地址 |
Tokyo JP |
