发明名称 ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 This technology provides a method for fabricating an electronic device. A method for fabricating an electronic device including a variable resistance element, which includes a free layer having a variable magnetization direction; a pinned layer having a first non-variable magnetization direction, and including first ferromagnetic materials and a first spacer layer interposed between adjacent two first ferromagnetic materials among the first ferromagnetic materials; a tunnel barrier layer interposed between the free layer and the pinned layer; a magnetic correction layer having a second magnetization direction which is anti-parallel to the first magnetization direction; and a third spacer layer interposed between the magnetic correction layer and the pinned layer, and providing an anti-ferromagnetic exchange coupling between the magnetic correction layer and the pinned layer.
申请公布号 US2017024336(A1) 申请公布日期 2017.01.26
申请号 US201615081484 申请日期 2016.03.25
申请人 SK hynix Inc. 发明人 Kim Guk-Cheon;Kim Yang-Kon;Noh Seung Mo;Choi Won-Joon
分类号 G06F13/16;H01L43/08;G06F13/42;H01L43/10;G06F12/08;H01L43/02;G11C11/16 主分类号 G06F13/16
代理机构 代理人
主权项 1. An electronic device comprising a semiconductor memory, wherein the semiconductor memory comprises: a free layer having a variable magnetization direction; a pinned layer having a first non-variable magnetization direction, and including first ferromagnetic materials and a first spacer layer interposed between adjacent two first ferromagnetic materials among the first ferromagnetic materials; a tunnel barrier layer interposed between the free layer and the pinned layer; a magnetic correction layer having a second magnetization direction which is anti-parallel to the first magnetization direction; and a third spacer layer interposed between the magnetic correction layer and the pinned layer, and providing an anti-ferromagnetic exchange coupling between the magnetic correction layer and the pinned layer.
地址 Icheon-Si KR