Inspection Apparatus, Inspection Method, Lithographic Apparatus and Manufacturing Method

摘要

Disclosed is a method of monitoring a lithographic process parameter, such as focus and/or dose, of a lithographic process. The method comprises acquiring a first and a second target measurement using respectively a first measurement configuration and a second measurement configuration, and determining the lithographic process parameter from a first metric derived from said first target measurement and said second target measurement. The first metric may be difference. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.

主权项

1. A method of monitoring a lithographic process parameter of a lithographic process, said method comprising:
acquiring a first target measurement, said first target measurement having been obtained from inspection of a target performed with a first measurement configuration; acquiring a second target measurement, said second target measurement having been obtained from inspection of a target performed with a second measurement configuration, wherein at least one measurement parameter is varied between said first measurement configuration and said second measurement configuration; and determining the lithographic process parameter from a first metric derived from said first target measurement and said second target measurement.