| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition suitable for use in simultaneous polishing of a part containing a group III-V compound material and a part containing a silicon material.SOLUTION: The polishing composition contains abrasive grains of irregular shape, and an oxidizer where the standard electrode potential is 0.3 V or higher, and preferably contains a salt, such as an ammonium salt, furthermore. The polishing composition has a pH of 1-6 or 8-14. |
