| 摘要 |
An abatement system 10 comprises a liquid ring pump 12 for compressing and pre-scrubbing gas evacuated from a processing chamber. The liquid ring pump has a gas inlet 14 for receiving evacuated gas, such as gas evacuated from a dry pumping arrangement. A liquid inlet 16 is provided for receiving liquid for generating a liquid ring in a stator 20 of the pump when a rotor 22 rotates in the stator. A gas and liquid outlet 24 is provided for exhausting gas and liquid in a gas/liquid ratio. A venturi scrubber 26 has an inlet for receiving the gas and liquid mixture from the liquid ring pump and a nozzle 30 for providing mixing of the gas with the liquid. A liquid sump 32 is provided for collecting liquid conveyed through the nozzle and a gas outlet is provided for exhausting gas from the venturi scrubber. The liquid ring pump is configured to exhaust gas and liquid at a pressure which drives the gas and liquid through the venturi scrubber.The abatement system provides for efficient scrubbing of water soluble and hydrolysable gases and an efficient means of capturing sub-micron particles. |
