发明名称 |
Process FOR THIN FILM DEPOSITION |
摘要 |
A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed. |
申请公布号 |
EP2102383(B1) |
申请公布日期 |
2017.01.25 |
申请号 |
EP20070868038 |
申请日期 |
2007.12.26 |
申请人 |
Eastman Kodak Company |
发明人 |
NELSON, Shelby Forrester;LEVY, David Howard;KERR, Roger Stanley |
分类号 |
C23C16/455;C23C16/44;C23C16/54 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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