发明名称 矯正装置
摘要 PROBLEM TO BE SOLVED: To provide a correction apparatus capable of more efficiently correcting a wafer that may not be performed only by pressing.SOLUTION: The correction apparatus includes: an upper plate 910, disposed at a molded wafer or an upper part of a printed-circuit board, provided with a first heater; and a table, disposed at the wafer or a lower part of the printed-circuit board, provided with a second heater. By heating the upper part and the lower part of the wafer that is molded at a time of correction, since a temperature of the upper part of the wafer becomes higher than a temperature of the lower part of the wafer, the correction is more efficiently performed.
申请公布号 JP6067053(B2) 申请公布日期 2017.01.25
申请号 JP20150089027 申请日期 2015.04.24
申请人 株式会社ダイナテク 发明人 鄭 義善
分类号 H01L21/677;B65G49/07 主分类号 H01L21/677
代理机构 代理人
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