| 摘要 |
PROBLEM TO BE SOLVED: To prevent a failure of an apparatus in a semiconductor manufacturing apparatus.SOLUTION: In a semiconductor manufacturing apparatus having a chamber 2, a container 10 storing a vapor deposition raw material M and including an opening 10a linked to the chamber 2, and a shutter 15 including a shutter surface 15a for blocking the opening 10a, a cavity 15b is provided inside the shutter 15, and a hole 15c linked to the cavity 15b is provided on the shutter surface 15a. |
