| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus and a film-forming mask capable of preventing the adhesion of a film-forming material to a non-film region while keeping the rigidity of the mask.SOLUTION: A film-forming apparatus forms a thin film on a filming region of a substrate through an opening M1 of a filming mask M. The mask M includes a mask body M2 having the opening M1 formed therein, and a seal member E formed in at least a portion of a region excepting the opening M1 for elastically deforming between itself and the substrate. In the seal member E, an elastic deformation due to by the holding load of a mask body M2 is equal to or more than the deformation of the mask body M2 in at least the mounted position of the seal member E. |
