| 摘要 |
PROBLEM TO BE SOLVED: To provide a functional film formation device in which uniformity of film thickness can be obtained corresponding to a desired shape (pattern) in functional film formation.SOLUTION: A functional film formation device comprises wettability condition setting means 10 which sets a wettability condition corresponding to a desired shape of a functional film, and the wettability condition setting means 10 includes a data reading unit 11, a data conversion unit 13, a wettability condition generation unit 15, a wettability condition selection unit 17, a film situation estimation unit 19, a flatness evaluation unit 21, a flatness determination unit 23 and a wettability condition output unit 25. Functional film formation is performed according to a specified wettability condition which is set by the wettability condition setting means 10 comprising these. |
