发明名称 マスクブランクの製造方法及び転写用マスクの製造方法
摘要 PROBLEM TO BE SOLVED: To provide a method of producing a mask blank using a translucent substrate which can determine more easily a concentration of hydrogen molecules contained in a translucent substrate.SOLUTION: A method of producing a mask blank for forming a thin film on the surface of a translucent substrate includes a step of preparing a translucent substrate capable of determining a concentration of hydrogen molecules from the appearance, a step of forming a thin film by sputtering and a step of carrying out an annealing treatment. In the step of forming a thin film, the sputtering conditions or the annealing treatment conditions are set according to a concentration of hydrogen molecules determined from the appearance of the substrate.
申请公布号 JP6066802(B2) 申请公布日期 2017.01.25
申请号 JP20130073333 申请日期 2013.03.29
申请人 HOYA株式会社 发明人 石原 重徳;小池 今朝広;菊地 寿治
分类号 G03F1/50;C03C17/245;C23C14/06;G03F1/54 主分类号 G03F1/50
代理机构 代理人
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