| 摘要 |
The present invention addresses the problem of providing a liquid solder resist composition that makes it possible to form a solder resist layer in which the reflectance is high and degradation resulting from light is particularly limited. This liquid solder resist composition comprises: a carboxyl group-containing resin; a photopolymerizable compound containing at least one compound selected from the group consisting of photopolymerizable monomers and photopolymerizable prepolymers; a photopolymerization initiator; titanium oxide; and a compound having a cyclic ether skeleton. The titanium oxide contains both rutile titanium oxide produced by the sulfuric acid method and rutile titanium oxide produced by the chlorine method. |
