| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor growth device which shortens the time for completing replacement of members in a chamber and improves the productivity of a semiconductor thin film, and to provide a component transfer method of the vapor growth device.SOLUTION: A vapor growth device includes: a lower chamber; an upper chamber; a susceptor; a susceptor cover; a ceiling board; a nozzle part which supports the ceiling board so that the ceiling board moves up and down; a susceptor lifting mechanism which moves up and down one of or both of the susceptor and the susceptor cover; a ceiling board outer periphery support part which supports an outer peripheral part of the ceiling board to move up and down the outer peripheral part of the ceiling board; a transfer arm which transfers at least one of or all of (members) the ceiling board, the susceptor, and the susceptor cover to the interior or the exterior of the chambers; a tentative receiving part composed of multiple arms capable of supporting the members from an outer circumferential direction of the members; and a control unit which controls the operations of the nozzle, the susceptor lifting mechanism, the ceiling board outer periphery support part, and the tentative receiving part. |
