| 摘要 |
An imprint apparatus cures an imprint material, while a pattern formed on a mold is kept in contact with the imprint material, thereby transferring the pattern onto the imprint material. The apparatus includes a measurement unit which performs, in parallel, alignment measurement in which a relative position between the mold and a shot region on the substrate, to which the pattern is to be transferred, is measured so as to align the mold and the shot region, and overlay measurement in which a relative position between a first pattern already formed in another shot region on the substrate using the mold, and a second pattern underlying the first patter is measured. |
