发明名称 |
Method of manufacturing light emitting element |
摘要 |
A method of manufacturing a semiconductor light emitting element includes forming a semiconductor stacked layer body on a substrate, the semiconductor stacked layer body including a first semiconductor layer and a second semiconductor layer; removing a portion of the semiconductor stacked layer body and exposing the first semiconductor layer such that the second semiconductor layer includes an extending portion that extends in a plane direction; forming a conductor layer electrically connecting the first semiconductor layer and the extending portion of the second semiconductor layer; forming a first electrode electrically connected to the first semiconductor layer and a second electrode electrically connected to the second semiconductor layer; forming a protective film covering at least a portion of the first electrode and at least a portion of the second electrode; and after forming the protective film, removing a portion of the exposed portion of the extending portion. |
申请公布号 |
US9553238(B2) |
申请公布日期 |
2017.01.24 |
申请号 |
US201514947716 |
申请日期 |
2015.11.20 |
申请人 |
NICHIA CORPORATION |
发明人 |
Kashimoto Kazuki;Itasaka Masafumi;Kasai Hisashi;Azuma Naoki |
分类号 |
H01L21/00;H01L33/38;H01L33/08 |
主分类号 |
H01L21/00 |
代理机构 |
Foley & Lardner LLP |
代理人 |
Foley & Lardner LLP |
主权项 |
1. A method of manufacturing a semiconductor light emitting element comprising:
forming a semiconductor stacked layer body on a substrate, the semiconductor stacked layer body comprising a first semiconductor layer and a second semiconductor layer having different conductivity types; removing a portion of the semiconductor stacked layer body and exposing the first semiconductor layer such that the second semiconductor layer includes an extending portion that extends in a plane direction; forming a conductor layer electrically connecting the first semiconductor layer and the extending portion of the second semiconductor layer such that a portion of an upper surface of the extending portion remains exposed from the conductor layer; after forming the conductor layer, forming a first electrode electrically connected to the first semiconductor layer and a second electrode electrically connected to the second semiconductor layer; forming a protective film covering at least a portion of the first electrode and at least a portion of the second electrode; and after forming the protective film, removing a portion of the exposed portion of the extending portion. |
地址 |
Anan-Shi JP |