发明名称 Method of manufacturing light emitting element
摘要 A method of manufacturing a semiconductor light emitting element includes forming a semiconductor stacked layer body on a substrate, the semiconductor stacked layer body including a first semiconductor layer and a second semiconductor layer; removing a portion of the semiconductor stacked layer body and exposing the first semiconductor layer such that the second semiconductor layer includes an extending portion that extends in a plane direction; forming a conductor layer electrically connecting the first semiconductor layer and the extending portion of the second semiconductor layer; forming a first electrode electrically connected to the first semiconductor layer and a second electrode electrically connected to the second semiconductor layer; forming a protective film covering at least a portion of the first electrode and at least a portion of the second electrode; and after forming the protective film, removing a portion of the exposed portion of the extending portion.
申请公布号 US9553238(B2) 申请公布日期 2017.01.24
申请号 US201514947716 申请日期 2015.11.20
申请人 NICHIA CORPORATION 发明人 Kashimoto Kazuki;Itasaka Masafumi;Kasai Hisashi;Azuma Naoki
分类号 H01L21/00;H01L33/38;H01L33/08 主分类号 H01L21/00
代理机构 Foley & Lardner LLP 代理人 Foley & Lardner LLP
主权项 1. A method of manufacturing a semiconductor light emitting element comprising: forming a semiconductor stacked layer body on a substrate, the semiconductor stacked layer body comprising a first semiconductor layer and a second semiconductor layer having different conductivity types; removing a portion of the semiconductor stacked layer body and exposing the first semiconductor layer such that the second semiconductor layer includes an extending portion that extends in a plane direction; forming a conductor layer electrically connecting the first semiconductor layer and the extending portion of the second semiconductor layer such that a portion of an upper surface of the extending portion remains exposed from the conductor layer; after forming the conductor layer, forming a first electrode electrically connected to the first semiconductor layer and a second electrode electrically connected to the second semiconductor layer; forming a protective film covering at least a portion of the first electrode and at least a portion of the second electrode; and after forming the protective film, removing a portion of the exposed portion of the extending portion.
地址 Anan-Shi JP