Abatement system having a plasma source

摘要

Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes a plasma source that has a first plate and a second plate parallel to the first plate. An electrode is disposed between the first and second plates and an outer wall is disposed between the first and second plates surrounding the electrode. The plasma source has a first plurality of magnets disposed on the first plate and a second plurality of magnets disposed on the second plate. The magnetic field created by the first and second plurality of magnets is substantially perpendicular to the electric field created between the electrode and the outer wall. In this configuration, a dense plasma is created.

主权项

1. An abatement system, comprising:
a plasma source, comprising:
a body having a first end and a second end, wherein the first end is configured to couple to the foreline; andan electrode disposed in the body; and an exhaust cooling apparatus coupled to the plasma source.