发明名称 |
Semiconductor device, related manufacturing method, and related electronic device |
摘要 |
A semiconductor device includes a substrate, a first transistor, and a second transistor. The first transistor includes a first source terminal formed of a material and connected to a first source, a first drain terminal formed of the material and connected to a first drain, a first gate overlapping a portion of the substrate that is between the first source and the first drain, and a first dielectric layer between the first gate and the substrate. The second transistor includes a control gate formed of the material and overlapping a part of the substrate that is positioned between a second source and a second drain, a second dielectric layer between the control gate and the substrate, a floating gate extending through the second dielectric layer to contact a doped region in the substrate, and an insulating member positioned between the control gate and the floating gate. |
申请公布号 |
US9553097(B2) |
申请公布日期 |
2017.01.24 |
申请号 |
US201514596782 |
申请日期 |
2015.01.14 |
申请人 |
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION |
发明人 |
Huang Herb He;Drowley Clifford Ian |
分类号 |
H01L27/115;H01L29/417;H01L29/66 |
主分类号 |
H01L27/115 |
代理机构 |
Innovation Counsel LLP |
代理人 |
Innovation Counsel LLP |
主权项 |
1. A semiconductor device comprising:
a semiconductor substrate; a first transistor comprising: a first source electrode positioned in the semiconductor substrate, a first drain electrode positioned in the semiconductor substrate, a first source connecting terminal formed of a first material and electrically connected to the first source electrode, a first drain connecting terminal formed of the first material and electrically connected to the first drain electrode, a first gate electrode overlapping a portion of the semiconductor substrate that is positioned between the first source electrode and the first drain electrode, and a first gate dielectric layer positioned between the first gate electrode and the semiconductor substrate; and a second transistor comprising: a doped region positioned in the semiconductor substrate, a second source electrode positioned in the semiconductor substrate, a second drain electrode positioned in the semiconductor substrate, a control gate electrode formed of the first material and overlapping a part of the semiconductor substrate that is positioned between the second source electrode and the second drain electrode, a second gate dielectric layer positioned between the control gate electrode and the semiconductor substrate and directly contacting the control gate electrode, a floating gate electrode having a first portion extending through an opening of the second gate dielectric layer to contact the doped region and having a second portion positioned between the control gate electrode and the second gate dielectric layer, and an insulating member positioned between the control gate electrode and the floating gate electrode. |
地址 |
CN |