发明名称 |
Semiconductor device models including re-usable sub-structures |
摘要 |
Methods and tools for generating measurement models of complex device structures based on re-useable, parametric models are presented. Metrology systems employing these models are configured to measure structural and material characteristics associated with different semiconductor fabrication processes. The re-useable, parametric sub-structure model is fully defined by a set of independent parameters entered by a user of the model building tool. All other variables associated with the model shape and internal constraints among constituent geometric elements are pre-defined within the model. In some embodiments, one or more re-useable, parametric models are integrated into a measurement model of a complex semiconductor device. In another aspect, a model building tool generates a re-useable, parametric sub-structure model based on input from a user. The resulting models can be exported to a file that can be used by others and may include security features to control the sharing of sensitive intellectual property with particular users. |
申请公布号 |
US9553033(B2) |
申请公布日期 |
2017.01.24 |
申请号 |
US201514594917 |
申请日期 |
2015.01.12 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Iloreta Jonathan;Laffin Matthew A.;Poslavsky Leonid;Kaack Torsten;Zhao Qiang;Lee Lie-Quan |
分类号 |
G06F17/50;H01L21/66 |
主分类号 |
G06F17/50 |
代理机构 |
Spano Law Group |
代理人 |
Spano Law Group ;Spano Joseph S. |
主权项 |
1. A metrology system comprising:
an illumination source configured to provide an amount of illumination light to one or more metrology targets; a detector configured to receive an amount of collected light from the one or more metrology targets in response to the amount of illumination light; one or more computer systems configured to:
receive an amount of measurement data associated with the detected light; anddetermine one or more parameters of a measurement model of the one or more metrology targets based on a fitting of the measurement model to the amount of measurement data, wherein the measurement model includes a first re-useable, parametric model of a first sub-structure of the one or more metrology targets; and a metrology model building tool comprising computer-readable instructions stored on a non-transitory, computer-readable medium, the computer-readable instructions comprising:
code for causing the one or more computer systems to receive an indication of a selection of the first re-useable, parametric model by a first user to describe at least a portion of the one or more metrology targets, wherein the first re-useable, parametric model includes multiple geometric elements and is fully defined by a first set of independent parameter values; andcode for causing the one or more computer systems to receive an indication of a selection of the first set of independent parameter values. |
地址 |
Milpitas CA US |