发明名称 |
Apparatus for controlling heat flow |
摘要 |
An apparatus configured to control a heat flow is provided. The apparatus may include a semiconductor device region formed in a matrix; a heat rectifier region formed adjacent to the semiconductor device region; and a heat flow blocker formed in at least one region contacting the semiconductor device region and the heat rectifier region. |
申请公布号 |
US9553083(B2) |
申请公布日期 |
2017.01.24 |
申请号 |
US201514804830 |
申请日期 |
2015.07.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD.;SNU R&DB FOUNDATION |
发明人 |
Park Yeonsang;Lee Byoungho;Hwang Sungwoo;Roh Younggeun;Lee Changwon |
分类号 |
H01L23/34;H01L27/02;H01L23/373 |
主分类号 |
H01L23/34 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. An apparatus configured to control a heat flow, the apparatus comprising:
a semiconductor device region formed in a matrix; a heat rectifier region formed adjacent to the semiconductor device region; and a heat flow blocker formed in at least one region contacting the semiconductor device region and the heat rectifier region, wherein the heat flow blocker comprises internal materials distributed in a matrix material layer. |
地址 |
Suwon-Si KR |