发明名称 Apparatus for controlling heat flow
摘要 An apparatus configured to control a heat flow is provided. The apparatus may include a semiconductor device region formed in a matrix; a heat rectifier region formed adjacent to the semiconductor device region; and a heat flow blocker formed in at least one region contacting the semiconductor device region and the heat rectifier region.
申请公布号 US9553083(B2) 申请公布日期 2017.01.24
申请号 US201514804830 申请日期 2015.07.21
申请人 SAMSUNG ELECTRONICS CO., LTD.;SNU R&DB FOUNDATION 发明人 Park Yeonsang;Lee Byoungho;Hwang Sungwoo;Roh Younggeun;Lee Changwon
分类号 H01L23/34;H01L27/02;H01L23/373 主分类号 H01L23/34
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. An apparatus configured to control a heat flow, the apparatus comprising: a semiconductor device region formed in a matrix; a heat rectifier region formed adjacent to the semiconductor device region; and a heat flow blocker formed in at least one region contacting the semiconductor device region and the heat rectifier region, wherein the heat flow blocker comprises internal materials distributed in a matrix material layer.
地址 Suwon-Si KR