发明名称 |
DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A display device capable of reducing the number of manufacturing processes and manufacturing costs and a method of manufacturing the display device are provided, the display device including: a first substrate; a gate transmission member and a pixel electrode on the first substrate; a gate insulating layer on the gate transmission member and the pixel electrode; a semiconductor layer on the gate insulating layer, the semiconductor layer overlapping a gate electrode of the gate transmission member; and a source electrode and a drain electrode on the semiconductor layer, wherein the gate transmission member includes a first conductive layer pattern and a second conductive layer pattern on the first conductive layer pattern, the first conductive layer pattern including a material the same as a material forming the pixel electrode. |
申请公布号 |
US2017018575(A1) |
申请公布日期 |
2017.01.19 |
申请号 |
US201615205447 |
申请日期 |
2016.07.08 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
MOON Youngmin |
分类号 |
H01L27/12;G02F1/1343;G02F1/1368 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a display device comprising:
forming a first conductive layer on a substrate; forming a second conductive layer on the first conductive layer; forming a first photoresist pattern and a second photoresist pattern on the second conductive layer, the second photoresist pattern having a thickness greater than a thickness of the first photoresist pattern; removing the first and second conductive layers using the first and second photoresist patterns as masks, to thereby form a gate transmission member and a pixel electrode pattern each comprising a first conductive layer pattern and a second conductive layer pattern; removing the first photoresist pattern to thereby form a residual pattern of the second photoresist pattern on the pixel electrode pattern; forming an etch stop layer on the gate transmission member and the residual pattern; removing the residual pattern to thereby form an etch stop layer pattern through which the second conductive layer pattern of the pixel electrode pattern is exposed; and removing the second conductive layer pattern of the pixel electrode pattern using the etch stop layer pattern as a mask, to thereby form a pixel electrode. |
地址 |
Yongin-si KR |