| 发明名称 |
USE OF SINTERED NANOGRAINED YTTRIUM-BASED CERAMICS AS ETCH CHAMBER COMPONENTS |
| 摘要 |
In accordance with this disclosure, there are provided several inventions, including an apparatus and method for creating a plasma resistant part, which may be formed of a sintered nanocrystalline ceramic material comprising yttrium, oxide, and fluoride. Example parts thus made may include windows, edge rings, or injectors. In one configuration, the parts may be yttria co-sintered with alumina, which may be transparent. |
| 申请公布号 |
US2017018408(A1) |
申请公布日期 |
2017.01.19 |
| 申请号 |
US201514800583 |
申请日期 |
2015.07.15 |
| 申请人 |
Lam Research Corporation |
发明人 |
XU Lin;SHIH Hong;DAUGHERTY John;SRINIVASAN Satish;LI Siwen |
| 分类号 |
H01J37/32;B32B38/00;B32B18/00;B32B37/24;C01F17/00;C04B35/64 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A plasma resistant part adapted for use in a plasma processing chamber which is configured to produce a plasma while in an operating mode, wherein the part comprises a plasma-facing surface configured to face the plasma when the plasma chamber is in the operating mode, wherein the surface is formed of a sintered nanocrystalline ceramic material comprising yttrium in addition to oxide and/or fluoride. |
| 地址 |
Fremont CA US |
