| 发明名称 |
CURVED SHAPED MASK, CURVED DEVICE HAVING COLOR RESISTS PATTERN AND METHOD FOR MANUFACTURING THE SAME |
| 摘要 |
The disclosure illustrates a curve-shaped mask, a curved device having color resist pattern and method for manufacturing the same. The curved device includes a curved substrate and at least two color resist layers. The at least two color resist layers are formed on the curved substrate, and construct a visible pattern together. |
| 申请公布号 |
US2017017160(A1) |
申请公布日期 |
2017.01.19 |
| 申请号 |
US201615211935 |
申请日期 |
2016.07.15 |
| 申请人 |
HSU MING-AN;LIN WEN-FU |
发明人 |
HSU MING-AN;LIN WEN-FU |
| 分类号 |
G03F7/40;G03F7/32;G03F7/20;B32B17/06;G03F7/16 |
主分类号 |
G03F7/40 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A curved device having color resist pattern, comprising:
a curved substrate; and at least two color resist layers formed on the curved substrate; wherein the at least two color resist layers construct a visible pattern together. |
| 地址 |
Chubei TW |
