PHOTOSENSITIVE RESIN COMPOSITION

摘要

Provided is a photosensitive resin composition having satisfactory development properties and no irregularities while ion migration is prevented. A photosensitive resin composition containing a reactive polymer having a carboxyl group and an ethylenically unsaturated double-bond group, a free-radical-based stabilizer, and a photo-acid generator, wherein the photosensitive resin composition is characterized in that the acid value of the reactive polymer is 40 to 100 mg KOH/g, the chlorine content of the reactive polymer is 150 ppm or less, and the free-radical-based stabilizer is selected from hindered amines or hindered amine-based derivatives; and a cured material using said photosensitive resin composition.