PATTERNING DEVICE COOLING SYSTEMS IN A LITHOGRAPHIC APPARATUS
摘要
A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
申请公布号
WO2017008996(A1)
申请公布日期
2017.01.19
申请号
WO2016EP63984
申请日期
2016.06.17
申请人
ASML NETHERLANDS B.V.;ASML HOLDING N.V.
发明人
VAN BOKHOVEN, Laurentius, Johannes, Adrianus;WARD, Christopher, Charles;VAN DER GAAG, Marc, Léon;KUNNEN, Johan, Gertrudis, Cornelis