SUBSTRATE PROCESSING DEVICE, SEMICONDUCTOR DEVICE PRODUCTION METHOD, AND VAPORIZATION SYSTEM

摘要

In order to provide a configuration that reduces the residue within a vaporizer while significantly enhancing vaporization performance, provided is a configuration that is equipped with: a vaporization chamber that has one end section and another end section; a first liquid supplying section that is connected to the vaporization chamber at the other end section and supplies, toward the one end section, a mixed liquid containing a first carrier gas mixed with a liquid starting material; and a second liquid supplying section that supplies, toward the mixed liquid at the one end section, a second carrier gas from the peripheral edge sides of the one end section toward the center thereof.