| 主权项 |
1. A gas delivery system for a substrate processing system, comprising:
a first valve including an inlet and an outlet, wherein the inlet is in fluid communication with a first gas source; a second valve including a first inlet, a second inlet and an outlet, wherein the first inlet is in fluid communication with the outlet of the first valve and the second inlet is in fluid communication with a second gas source; a third valve including an inlet and an outlet, wherein the inlet is in fluid communication with a third gas source; and a connector comprising:
a first gas channel;a cylinder defining a second gas channel having a first end and a second end,wherein the cylinder is at least partially disposed within the first gas channel such that the cylinder and the first gas channel collectively define a flow channel between an outer surface of the cylinder and an inner surface of the first gas channel,wherein the flow channel is in fluid communication with the outlet of the third valve and the first end of the second gas channel; anda third gas channel in fluid communication with the second end of the second gas channel, with the outlet of the second valve and with a gas distribution device of a processing chamber,wherein the first end of the second gas channel is in fluid communication with an inlet of the first gas channel such that gas provided to an inlet in the second end of the second gas channel flows through the second channel from the second end to the first end, into the inlet of the first gas channel, and through the first gas channel into the third gas channel. |
