METHOD FOR PECVD DEPOSITION OF A GRAPHENE-BASED LAYER ON A SUBSTRATE

摘要

The invention relates to a method for depositing a graphene-based layer on a substrate by chemical vapour deposition wherein at least one hydrocarbon as starting material for a chemical reaction is admitted to a vacuum chamber and concurrently a plasma is formed within the vacuum chamber. The plasma here is generated using at least one magnetron comprising at least one target of a material comprising at least one catalytically active metal from the group of chemical elements having atomic numbers 21 to 30, 39 to 48, 57, 72 to 80 and 89, the sputtering of the target being set such that the fraction of target particles incorporated in the graphene-based layer is less than 1 at%.