MASK WITH MULTILAYER STRUCTURE AND MANUFACTURING METHOD BY USING THE SAME

摘要

The present disclosure provides a photolithography mask. The photolithography mask includes a substrate that contains a low thermal expansion material (LTEM). A multilayer (ML) structure is disposed over the substrate. The ML structure is configured to reflect radiation. The ML structure contains a plurality of interleaving film pairs. Each film pair includes a first film and a second film. The first film and the second film have different material compositions. Each film pair has a respective thickness. For at least a subset of the plurality of the film pairs, the respective thicknesses of the film pairs change randomly along a predefined direction.

主权项

1. A photolithography mask, comprising:
a substrate that contains a low thermal expansion material (LTEM); and a multilayer (ML) structure disposed over the substrate, the ML structure being configured to reflect radiation, wherein: the ML structure contains a plurality of interleaving film pairs; each film pair includes a first film and a second film, the first film and the second film having different material compositions; each film pair has a respective thickness; and for at least a subset of the plurality of the film pairs, the respective thicknesses of the film pairs change randomly along a predefined direction.