发明名称 ナチュラトロンスパッタ装置
摘要 PROBLEM TO BE SOLVED: To provide a naturatron sputtering system that complies with various needs and is high in flexibility.SOLUTION: A naturatron sputtering system 2 is provided with a sputtering section, where paired targets 9 are arranged opposite to each other with a spacing, and magnets for forming a magnetic field space between the targets 9 are arranged on back sides of the targets 9, respectively, in a vacuum container 1. The magnetic field space has a magnetic field distribution which is high in magnetic flux density at the peripheral part and low in magnetic flux density at the center part. Further, the naturatron sputtering system 2 has a substrate arranged on the lateral side of the space between the targets 9, while facing the magnetic field space. The magnets includes main magnets 12 and auxiliary magnets 11, which cooperate with each other to change the magnetic flux density at the center part relatively to the magnetic flux density at the peripheral part.
申请公布号 JP6061408(B2) 申请公布日期 2017.01.18
申请号 JP20150092902 申请日期 2015.04.30
申请人 一般社団法人薄膜技術産業普及協会 发明人 平田 豊明
分类号 C23C14/35;C23C14/34 主分类号 C23C14/35
代理机构 代理人
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