| 摘要 |
The invention provides a plasma processing container and a plasma processing device. In a plasma processing device taking an inductive coupling plasma processing device as the primary, the deformation of a cover part caused by heating can be suppressed. The connection part of a main body container (2A) and an upper container (2B) of the inductive coupling plasma processing device (1) is provided with an O-shaped ring (51), a heat insulation part (52), and a winding shielding part (53) all over the periphery. The heat insulation part (52) is embedded into the groove (62) for the heat insulation part (52) which includes a plurality of long-strip shaped heat insulation plates (54). A clearance (CL) is arranged between the main body container (2A) and the upper container (2B) by means of the heat insulation part (52). The heat insulation part (52) makes the main body container (2A) and the upper container (2B) thermally isolate, the deformation amount can be absorbed even though the upper container (2B) deforms because of heat. |
