| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment device capable of minimizing degradation in the surface treatment performance of a substrate, and capable of suppressing deposition of sediment on the inner wall of the surface treatment device.SOLUTION: A surface treatment device 1 includes a raw material fluid discharge section 30 that is a flow path spreading from the lower end of a raw material fluid inflow section 28 toward the downstream side of a raw material fluid 32, so as to surround the lateral periphery of a sample holding base 12, and a sub-fluid introduction section 26 provided in the raw material fluid discharge section 30, and arranged perpendicularly or substantially perpendicularly to the flow direction of the raw material fluid 32 flowing through the raw material fluid inflow section 28, so that a sub-fluid 22 flows along the inner wall of the raw material fluid discharge section 30. |
