| 摘要 |
PROBLEM TO BE SOLVED: To provide a heater for cleaning a wafer with excellent corrosion resistance and durability.SOLUTION: A heater for cleaning a wafer to heat a wafer in cleaning the wafer comprises: an upper plate 1 and a lower plate 2 that are respectively made of silicon carbide or a composite material containing silicon carbide; a sealing member 3 such as an O-ring sandwiched between the upper plate 1 and the lower plate 2; and a heating mechanism 4 provided in a space surrounded by the upper plate 1, the lower plate 2 and the sealing member 3. It is preferably that a cylindrical support 5 is provided on a lower side of the lower plate 2, and therefore, lead wires 6a, 6b connected to the heating mechanism 4 and a temperature measuring element 7 can be housed inside the support 5. |
