发明名称 塩、レジスト組成物及びレジストパターンの製造方法
摘要 PROBLEM TO BE SOLVED: To provide a resist composition satisfying shape of resist patterns.SOLUTION: This salt is expressed by formula (I). In the formula (I), Qand Qeach independently represents a fluorine atom or a perfluoroalkyl group; Land Leach independently represents a bivalent 1-17C saturated hydrocarbon group or the like; Lrepresents an oxygen atom, a methylene group or -CO-CH-; ring Wrepresents an aromatic ring; ring Wrepresents an aliphatic ring; Rrepresents a hydroxy group, alkyl group or alkoxy group; Rrepresents an alkyl group or alkoxy group; Rrepresents a hydroxy group, hydroxyalkyl group or hydroxyalkoxy group, or the like; s and t each independently denotes an integer of 0-2; u denotes an integer of 1-3; and Zrepresents an organic counter ion.
申请公布号 JP6062220(B2) 申请公布日期 2017.01.18
申请号 JP20120252239 申请日期 2012.11.16
申请人 住友化学株式会社 发明人 市川 幸司;落合 光良;山下 裕子
分类号 C07C309/17;G03F7/004;G03F7/039 主分类号 C07C309/17
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