发明名称 APPLICATOR WITH PLUNGER HAVING MOVABLE RANGE RESTRICTED BY RESISTANCE STRUCTURE
摘要 Provided herein is an applicator which is more inexpensive than those according to the related art and in which a plunger 7 does not easily slip out of a cylindrical syringe 5. A cylindrical syringe 5 and a plunger 7 are each molded from a resin material. A resistance structure is provided between the inner peripheral surface of the cylindrical syringe 5 and the outer peripheral surface of a pressing portion 72 of the plunger 7. The resistance structure is configured to act as resistance to movement of the pressing portion 72 when the pressing portion 72 is moved toward a cartridge fitting portion 52 beyond a predetermined position P and to movement of the pressing portion 72 when the pressing portion 72 is moved from the side of the cartridge fitting portion 52 toward an end of the cylindrical syringe 5 opposite to the cartridge fitting portion 52 beyond the predetermined position.
申请公布号 EP3117850(A1) 申请公布日期 2017.01.18
申请号 EP20160178446 申请日期 2016.07.07
申请人 Shofu Inc. 发明人 TAKEI, Ryouji;YONEDA, Akira;SAKAMOTO, Shuji;KADOBAYASHI, Yusei
分类号 A61M5/00 主分类号 A61M5/00
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