发明名称 蒸着用マスク、蒸着用マスクの製造方法及び有機エレクトロルミネッセンス素子の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a mask for vapor deposition that can suppress a vapor-deposited surface of a vapor-deposited body from being damaged, shaven, etc., even if the vapor-deposited body thermally deforms when a vapor-deposition film in a predetermined pattern shape is formed on the vapor-deposited surface.SOLUTION: A mask 1 for vapor deposition is a plate-like mask for vapor deposition which is arranged opposite a vapor-deposition target surface 21 of a vapor-deposition target body 20 so as to form a vapor-deposition film in a predetermined pattern shape on the vapor-deposition target surface 21, and has an opening part 3 in the predetermined pattern shape formed by wet etching, and a corner part formed 6 of a surface 4 opposed to the vapor-deposition target surface 21 and an inner wall surface 5 of the opening part 3 is beveled.
申请公布号 JP6060862(B2) 申请公布日期 2017.01.18
申请号 JP20130189964 申请日期 2013.09.13
申请人 コニカミノルタ株式会社 发明人 山本 夏樹
分类号 C23C14/04;C23C14/24;H01L51/50;H05B33/10;H05B33/26 主分类号 C23C14/04
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