发明名称 |
Lithographic Apparatus and Method |
摘要 |
Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame. |
申请公布号 |
NL2016889(A) |
申请公布日期 |
2017.01.17 |
申请号 |
NL20162016889 |
申请日期 |
2016.06.03 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WILHELMUS PATRICK ELISABETH MARIA OP T ROOT;HERMAN PHILIP GODFRIED;MARC WILHELMUS MARIA VAN DER WIJST;HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL;ARIJ JONATHAN RIJKE;MATHIJS LEONARDUS JOHAN VERHEES |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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