发明名称 Lithographic Apparatus and Method
摘要 Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.
申请公布号 NL2016889(A) 申请公布日期 2017.01.17
申请号 NL20162016889 申请日期 2016.06.03
申请人 ASML NETHERLANDS B.V. 发明人 WILHELMUS PATRICK ELISABETH MARIA OP T ROOT;HERMAN PHILIP GODFRIED;MARC WILHELMUS MARIA VAN DER WIJST;HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL;ARIJ JONATHAN RIJKE;MATHIJS LEONARDUS JOHAN VERHEES
分类号 G03F7/20 主分类号 G03F7/20
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