Semiconductor device including capacitor and method for manufacturing the same

摘要

A semiconductor device includes a semiconductor substrate having a first region and a second region; a first planar type capacitor including a gate electrode which is positioned in any one region of the first region and the second region; a non-planar type capacitor including a plurality of non-planar type electrodes which are positioned in the other region of the first region and the second region; a second planar type capacitor including a planar type electrode which is positioned over the first planar type capacitor to overlap with the first planar type capacitor; and a common node under the non-planar type capacitor.

主权项

1. A semiconductor device comprising:
a semiconductor substrate including a first region and a second region; a first planar type capacitor including a gate electrode and positioned in the first region; a non-planar type capacitor including a plurality of non-planar type electrodes and positioned in the second region; a second planar type capacitor including a planar type electrode, positioned over the first planar type capacitor, and overlapping with the first planar type capacitor; and a common node provided under the non-planar type capacitor, wherein the second planar type capacitor comprises a first planar type electrode, a dielectric layer over the first planar type electrode, and a second planar type electrode over the dielectric layer, wherein the first planar type electrode partially overlaps with the gate electrode, and wherein the first planar type electrode of the second planar type capacitor and the gate electrode are electrically coupled with each other through a internal plug.