发明名称 |
High resistivity coating compositions having unique percolation behavior, and electrostatic image developing systems and components thereof incorporating same |
摘要 |
Disclosed herein are resistive composites comprising at least one resin; at least one carbon black having a surface hydrophobically modified with at least one organic group, the at least one organic group having a molecular weight of the composite of 4000 or less and comprising the formula —X(G)-, wherein X is directly attached to the at least one carbon black and is selected from arylene, heteroarylene, and alkylene, G is a substituent of X, and —X(G)- is nonionic; and wherein the resistive composite has a volume resistivity, Rv, at a relative volume fraction, XCB, of the at least one carbon black in the coating, where Rv is at least 106 ohm-cm; and log Rv has a substantially linear relationship with XCB when XCB is varied from 0.1 to 0.5. Also disclosed are coatings made from such composites, such as coatings for rollers/belts for office automation machines, and methods of making such coatings. |
申请公布号 |
US9546286(B2) |
申请公布日期 |
2017.01.17 |
申请号 |
US201214233457 |
申请日期 |
2012.07.20 |
申请人 |
Cabot Corporation |
发明人 |
Step Eugene N.;Korchev Andriy;Kyrlidis Agathagelos;Haynes Clovis D.;Schulz Gregory R.;Szwec John R. |
分类号 |
C09C1/48;C09D7/12;C09C3/08;G03G15/00;C08K9/04;G03G15/02;G03G15/08;G03G15/16 |
主分类号 |
C09C1/48 |
代理机构 |
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代理人 |
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主权项 |
1. A resistive composite comprising:
at least one resin; at least one carbon black having a surface hydrophobically modified with at least one organic group, the at least one organic group having a molecular weight of 4000 or less and comprising the formula —X(G)-, wherein X is directly attached to the at least one carbon black and is selected from arylene, heteroarylene, and alkylene, G is a substituent of X, and —X(G)- is nonionic, and wherein:
the resistive composite has a volume resistivity, Rv, at a relative volume fraction, XCB, of the at least one carbon black in the composite, where Rv is at least 106 ohm-cm; andlog Rv has a substantially linear relationship with XCB when XCB is varied from 0.1 to 0.5. |
地址 |
Boston MA US |