发明名称 Charged particle beam writing apparatus, and charged particle beam writing method
摘要 Charged particle beam writing apparatus includes a first generation unit to generate a smallest deflection region layer in three or more deflection region layers each having deflection regions of a size different from those of other deflection region layers, for each of a plurality of figure types variably shapable using first and second shaping apertures, an assignment unit to assign each of a plurality of shot figure patterns to deflection regions of the smallest deflection region layer of a corresponding one of the plurality of figure types, a correction unit to correct, by shifting the position of each smallest deflection region layer, according to a variable shaping position of each figure type, and a writing unit to write each of the plurality of shot figure patterns on a target object, in a state where the position of each smallest deflection region layer has been corrected for each figure type.
申请公布号 US9548183(B2) 申请公布日期 2017.01.17
申请号 US201414459470 申请日期 2014.08.14
申请人 NuFlare Technology, Inc. 发明人 Yashima Jun
分类号 H01J37/147;H01J37/317 主分类号 H01J37/147
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A charged particle beam writing apparatus comprising: a first generation unit configured to generate a smallest deflection region layer in three or more deflection region layers each having deflection regions of a size different from those of other deflection region layers, for each figure type of a plurality of figure types which can be variably shaped using a first shaping aperture and a second shaping aperture; an assignment unit configured to assign each of a plurality of shot figure patterns to deflection regions of the smallest deflection region layer of a corresponding one of the plurality of figure types; a correction unit configured to perform correction to shift a position of each of the smallest deflection region layer, in accordance with a variable shaping position of the each figure type; and a writing unit configured to write the each of the plurality of shot figure patterns on a target object with a charged particle beam, in a state where the position of the each of the smallest deflection region layer has been corrected for the each figure type.
地址 Yokohama JP
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