发明名称 Photoresist with rare-earth sensitizers
摘要 A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is useful to pattern circuits by visible light.
申请公布号 US9547238(B2) 申请公布日期 2017.01.17
申请号 US201314413255 申请日期 2013.02.19
申请人 Pavel Eugen 发明人 Pavel Eugen
分类号 G03F7/004;G03F7/028;G03F7/039;G03F7/20;B23K26/00;G03F7/038 主分类号 G03F7/004
代理机构 Lucas & Mercanti, LLP 代理人 Lucas & Mercanti, LLP ;Myers Jonathan
主权项 1. A photoresist composition having a quantum multiphoton confinement effect and which is capable of forming an image when exposed to visible light, which comprises: (a) about 0.1 to about 10% by weight of a rare earth (RE) complex as a sensitizer in which a rare earth ion is encapsulated by organic ligands, the RE complex sensitizer selected from the group consisting of a RE picolinate, an RE lissamine, a RE(fod)3 wherein fod is 6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate, a RE(TTA)3 Phen wherein TTA is theonyltrifluoroacetone and Phen is 1,10-phenanthroline, a RE(DBM)3 Phen wherein DBM is dibenzoylmethane and Phen is 1,10-phenanthroline, and a RE fulleride; and (b) an ultraviolet, deep ultraviolet or extreme ultraviolet photoresist wherein the RE complex encapsulated by organic ligands is dissolved in the photoresist.
地址 Bucharest RO