发明名称 Semiconductor device
摘要 According to an embodiment, a semiconductor device includes a semiconductor substrate, a first region that is provided on the semiconductor substrate and has a line-and-space pattern extending in a first direction, and a second region that is provided adjacent to the first region on the semiconductor substrate and has a dummy pattern. The surface area per unit area of the second region is greater than the surface area per unit area of the first region.
申请公布号 US9548310(B2) 申请公布日期 2017.01.17
申请号 US201514611929 申请日期 2015.02.02
申请人 Kabushiki Kaisha Toshiba 发明人 Kaneko Hajime;Nagashima Satoshi
分类号 H01L29/06;H01L27/115 主分类号 H01L29/06
代理机构 Patterson & Sheridan, LLP 代理人 Patterson & Sheridan, LLP
主权项 1. A semiconductor device, comprising: a semiconductor substrate including a first region and a second region adjacent to the first region, wherein a first line-and-space pattern extending along the semiconductor substrate in a first direction is disposed in the first region, a dummy pattern is disposed in the second region and has a surface area per unit area that is greater than a surface area of per unit area of the first line-and-space pattern, the dummy pattern includes a second line-and-space pattern that extends along the semiconductor substrate in the first direction, the second line-and-space pattern having a line width in a second direction along the semiconductor substrate and perpendicular to the first direction that is equal to a line width in the second direction of the first line-and-space pattern, and a first spacing distance in the second direction between lines of the first line-and-space pattern is greater than a second spacing distance in the second direction between lines of the second line-and-space pattern.
地址 Tokyo JP