发明名称 |
Semiconductor device |
摘要 |
According to an embodiment, a semiconductor device includes a semiconductor substrate, a first region that is provided on the semiconductor substrate and has a line-and-space pattern extending in a first direction, and a second region that is provided adjacent to the first region on the semiconductor substrate and has a dummy pattern. The surface area per unit area of the second region is greater than the surface area per unit area of the first region. |
申请公布号 |
US9548310(B2) |
申请公布日期 |
2017.01.17 |
申请号 |
US201514611929 |
申请日期 |
2015.02.02 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Kaneko Hajime;Nagashima Satoshi |
分类号 |
H01L29/06;H01L27/115 |
主分类号 |
H01L29/06 |
代理机构 |
Patterson & Sheridan, LLP |
代理人 |
Patterson & Sheridan, LLP |
主权项 |
1. A semiconductor device, comprising:
a semiconductor substrate including a first region and a second region adjacent to the first region, wherein a first line-and-space pattern extending along the semiconductor substrate in a first direction is disposed in the first region, a dummy pattern is disposed in the second region and has a surface area per unit area that is greater than a surface area of per unit area of the first line-and-space pattern, the dummy pattern includes a second line-and-space pattern that extends along the semiconductor substrate in the first direction, the second line-and-space pattern having a line width in a second direction along the semiconductor substrate and perpendicular to the first direction that is equal to a line width in the second direction of the first line-and-space pattern, and a first spacing distance in the second direction between lines of the first line-and-space pattern is greater than a second spacing distance in the second direction between lines of the second line-and-space pattern. |
地址 |
Tokyo JP |