| 摘要 |
A lithographic apparatus obtains a height map (402) of a substrate and uses the height map when controlling imaging of the pattern to the substrate. The apparatus is arranged to disregard at least partially height anomalies (B) when controlling the imaging. The height anomalies may be identified by processing the height map. For example, in some embodiments the height anomalies are identified using a shape recognition model. In some embodiments, a modified version of the height map (802) is produced in which the height anomalies are at least partially removed, and the modified version of the height map is used in controlling said imaging. Alternatively, an anomaly map is used together with the (unmodified) height map to control imaging. |
