| 摘要 |
A chemical deposition apparatus having conductance control, which includes a showerhead module having a faceplate and a backing plate, the showerhead module including a plurality of inlets which deliver reactor chemistries to a cavity and exhaust outlets which remove reactor chemistries, a pedestal module configured to support a substrate and which moves vertically to close the cavity between the pedestal module and an outer portion of the faceplate, and at least one conductance control assembly, which is in fluid communication with the cavity via the exhaust outlets. The at least one conductance control assembly selected from one or more of the following: a ball valve assembly, a fluidic valve, magnetically coupled rotary plates, and/or a linear based magnetic system. |
| 主权项 |
1. A method of controlling conductance within a cavity of a chemical deposition apparatus, comprising:
processing a substrate in the cavity of the chemical deposition apparatus, the cavity formed between a showerhead module and a substrate pedestal module configured to receive the substrate, wherein the showerhead module includes a plurality of inlets which delivers reactor chemistries to the cavity and exhaust outlets which remove reactor chemistries and purging gases from the cavity; injecting a purging gas into the cavity; and controlling a change in conductance of the cavity with at least one conductance control assembly, which is in fluid communication with the cavity via the exhaust outlets, the at least one conductance control assembly selected from one or more of the following:
(a) a ball valve assembly, the ball valve assembly comprising:
a housing having a conical lower portion;a conduit extending from the conical lower portion of the housing to one or more of the exhaust outlets of the cavity, the conduit having an inlet and an outlet; anda spherical body configured to fit within the conical lower portion, and wherein the spherical body is configured to block the outlet of the conduit and prevent a flow of the reactor chemistries through the conduit during a dosing step, and to allow the reactor chemistries and a purge gas to flow from the cavity into one or more evacuation vacuum lines upon exceeding a first pressure and flow rate within the cavity during a purging step by rising upward to provide an opening between a lower surface of the spherical body and the outlet of the conduit;(b) a fluidic valve, the fluidic valve having a modulating gas portion and a chamber outflow portion, the modulating gas portion configured to direct a stream of modulating gas from a modulating gas supply into a flow of reactor chemistries from the cavity, and wherein the stream of modulating gas modulates flow resistance experienced by the flow of the reactor chemistries from the cavity;(c) a rotary valve, the rotary valve comprising:
an upper rotating plate; anda lower rotating plate magnetically coupled to the upper rotating plate, the lower rotating plate having a plurality of conduits, each of the plurality of conduits configured to receive reactor chemistries from the cavity from a corresponding evacuation conduit within the showerhead module, which is in fluid communication with one or more of the exhaust outlets; and/or(d) a magnetically coupled linear valve, the magnetically coupled linear valve comprising:
a magnetic housing; anda plurality of linear rods, which are configured to be magnetically raised and lower within a plurality of channels, each of the plurality of linear rods having a proximal portion, which is configured to be magnetically coupled to the magnetic housing, which raises and lowers the plurality of linear rods within the magnetic housing, and a distal end, which acts as a valve for releasing the reactor chemistries and/or the purge gas from the exhaust outlets. |
