| 摘要 |
A photomask (1) and a preparation method for a color film substrate, which relate to the technical field of display, and are capable of simplifying a preparation process of a color film substrate and improving the production efficiency of the color film substrate. The photomask (1) comprises: a first part (11) having a first light transmittance, a second part (12) having a second light transmittance, and a third part (13) having a third light transmittance. The first part (11) corresponds to a flat layer (3) of the color film substrate, the second part (12) corresponds to an auxiliary spacer (4) of the color film substrate, and the third part (13) corresponds to a master spacer (5) of the color film substrate. |
