FILM-FORMING PROCESSING APPARATUS, FILM-FORMING METHOD, AND STORAGE MEDIUM

摘要

A film-forming processing apparatus includes a first heater heating an entire heat treatment region of a substrate, a second heater heating the substrate to have an in-plane temperature distribution having a concentric shape, a gas supplier supplying a process gas to a rotary table; and a control part outputting a control signal for executing a first step of setting a rotation position of the rotary table such that the substrate on the rotary table is placed in a position corresponding to the second heater and forming the in-plane temperature distribution having the concentric shape on the substrate by heating the substrate by the second heater, and a second step of performing a film forming process on the substrate by rotating the rotary table in a state where a heating energy received by the substrate from the second heater is smaller than that in the first step.

主权项

1. A film-forming processing apparatus for performing a film formation by supplying a process gas to a substrate which is mounted on one surface side of a rotary table installed in a vacuum vessel, the substrate being revolved by a rotation of the rotary table, comprising:
a first heating part configured to heat an entire heat treatment region of the substrate in the vacuum vessel; a second heating part installed to face the rotary table, corresponding to the substrate mounted on the rotary table and configured to heat the substrate to have an in-plane temperature distribution having a concentric shape; a process gas supply part configured to supply the process gas to the one surface side of the rotary table; and a control part configured to output a control signal for executing a first step of setting a rotation position of the rotary table such that the substrate on the rotary table is placed in a position corresponding to the second heating part and forming the in-plane temperature distribution having the concentric shape on the substrate by heating the substrate by the second heating part, and a second step of performing a film forming process on the substrate by rotating the rotary table in a state where a heating energy received by the substrate from the second heating part is smaller than that in the first step.