CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE

摘要

A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion provides a surface (103) of an electrically insulating material, wherein the surface (103) is configured to face one or more sputter deposition sources during the sputter deposition process.