发明名称 |
SYSTEMS AND METHODS FOR REMOVING PARTICLES FROM A SUBSTRATE PROCESSING CHAMBER USING RF PLASMA CYCLING AND PURGING |
摘要 |
Systems and methods for operating a substrate processing system include processing a substrate arranged on a substrate support in a processing chamber. At least one of precursor gas and/or reactive gas is supplied during the processing. The substrate is removed from the processing chamber. Carrier gas and purge gas are selectively supplied to the processing chamber. RF plasma is generated in the processing chamber during N cycles, where N is an integer greater than one. The RF plasma is on for a first period and off for a second period during each of the N cycles. The purge gas is supplied during at least part of each of the N cycles. |
申请公布号 |
US2017011893(A1) |
申请公布日期 |
2017.01.12 |
申请号 |
US201615271841 |
申请日期 |
2016.09.21 |
申请人 |
Lam Research Corporation |
发明人 |
Kang Hu;LaVoie Adrien |
分类号 |
H01J37/32;C23C16/52;C23C16/50;C23C16/455 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate processing system comprising:
a processing chamber including a substrate support to support a substrate during processing; a gas supply to selectively supply carrier gas, purge gas, and at least one gas selected from a group including precursor gas and reactive gas during the processing; a radio frequency (RF) plasma generator to selectively generate RF plasma in the processing chamber; and a controller that communicates with the gas supply and the RF plasma generator and that is configured to:
a) supply the carrier gas to the processing chamber after the substrate is removed from the processing chamber;b) generate RF plasma in the processing chamber during N cycles, where N is an integer greater than one, wherein the N cycles include alternating first periods and second periods, and wherein the RF plasma is on for the first periods and off for the second periods during the N cycles;c) not supply the purge gas during the first periods of the N cycles when the RF plasma is on; and(d) supply the purge gas during the second periods of the N cycles when the RF plasma is off. |
地址 |
Fremont CA US |