发明名称 HEATING DEVICE, FIXING DEVICE, IMAGE FORMING APPARATUS, AND BASE MATERIAL FOR HEATING DEVICE
摘要 A heating device includes a belt member that is rotated, plural heating elements that are arranged in a width direction of the belt member and generate heat so as to heat the belt member, plural resistance elements that have positive temperature coefficients and are connected to the plural heating elements such that each of the plural resistance elements is connected in series with a corresponding one of the plural heating elements, and a base material that includes a heat-conductive metal layer and a pair of heat-resistant metal layers between which the heat-conductive metal layer is interposed and has a surface on which the plural heating elements and the plural resistance elements are disposed. A temperature of the belt member is reduced by an increase in resistances of the plural resistance elements caused by an increase in temperatures of the plural resistance elements.
申请公布号 US2017010567(A1) 申请公布日期 2017.01.12
申请号 US201615052199 申请日期 2016.02.24
申请人 FUJI XEROX CO., LTD. 发明人 TAMEMASA Hiroshi;INOUE Tohru;OHASHI Takashi;AMANO Jumpei;KOYANAGI Kiyoshi
分类号 G03G15/20 主分类号 G03G15/20
代理机构 代理人
主权项 1. A heating device comprising: a belt member that is rotated; a plurality of heating elements that are arranged in a width direction of the belt member and that generate heat so as to heat the belt member; a plurality of resistance elements that have positive temperature coefficients and that are connected to the plurality of heating elements such that each of the plurality of resistance elements is connected in series with a corresponding one of the plurality of heating elements; and a base material that includes a heat-conductive metal layer and a pair of heat-resistant metal layers between which the heat-conductive metal layer is interposed and that has a surface on which the plurality of heating elements and the plurality of resistance elements are disposed, wherein a temperature of the belt member is reduced by an increase in resistances of the plurality of resistance elements caused by an increase in temperatures of the plurality of resistance elements.
地址 Tokyo JP